Structural and morphological dataset for rf-sputtered WC-Co thin films using synchrotron radiation methods

Control and manipulation of synthesis parameters of thin film coatings is of critical concern in determination of material properties and performance. Structural and morphological properties of rf-sputtered WC-Co thin films deposited under varying deposition parameters namely, substrate temperature...

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Detalles Bibliográficos
Autores principales: Phiri, R.R., Oladijo, O.P., Nakajima, H., Rattanachata, A., Akinlabi, E.T.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Elsevier 2019
Materias:
Materials Science
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6728266/
https://www.ncbi.nlm.nih.gov/pubmed/31516929
http://dx.doi.org/10.1016/j.dib.2019.104383

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6728266/
https://www.ncbi.nlm.nih.gov/pubmed/31516929
http://dx.doi.org/10.1016/j.dib.2019.104383

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