Soft X-ray varied-line-spacing gratings fabricated by near-field holography using an electron beam lithography-written phase mask

A fabrication method comprising near-field holography (NFH) with an electron beam lithography (EBL)-written phase mask was developed to fabricate soft X-ray varied-line-spacing gratings (VLSGs). An EBL-written phase mask with an area of 52 mm × 30 mm and a central line density greater than 3000 line...

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Detalles Bibliográficos
Autores principales: Lin, Dakui, Liu, Zhengkun, Dietrich, Kay, Sokolov, Andréy, Sertsu, Mewael Giday, Zhou, Hongjun, Huo, Tonglin, Kroker, Stefanie, Chen, Huoyao, Qiu, Keqiang, Xu, Xiangdong, Schäfers, Franz, Liu, Ying, Kley, Ernst-Bernhard, Hong, Yilin
Formato: Online Artículo Texto
Lenguaje:English
Publicado: International Union of Crystallography 2019
Materias:
Research Papers
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6730620/
https://www.ncbi.nlm.nih.gov/pubmed/31490170
http://dx.doi.org/10.1107/S1600577519008245

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6730620/
https://www.ncbi.nlm.nih.gov/pubmed/31490170
http://dx.doi.org/10.1107/S1600577519008245

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