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Robust trap effect in transition metal dichalcogenides for advanced multifunctional devices
Defects play a crucial role in determining electric transport properties of two-dimensional transition metal dichalcogenides. In particular, defect-induced deep traps have been demonstrated to possess the ability to capture carriers. However, due to their poor stability and controllability, most stu...
Autores principales: | , , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group UK
2019
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6742650/ https://www.ncbi.nlm.nih.gov/pubmed/31515481 http://dx.doi.org/10.1038/s41467-019-12200-x |
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author | Yin, Lei He, Peng Cheng, Ruiqing Wang, Feng Wang, Fengmei Wang, Zhenxing Wen, Yao He, Jun |
author_facet | Yin, Lei He, Peng Cheng, Ruiqing Wang, Feng Wang, Fengmei Wang, Zhenxing Wen, Yao He, Jun |
author_sort | Yin, Lei |
collection | PubMed |
description | Defects play a crucial role in determining electric transport properties of two-dimensional transition metal dichalcogenides. In particular, defect-induced deep traps have been demonstrated to possess the ability to capture carriers. However, due to their poor stability and controllability, most studies focus on eliminating this trap effect, and little consideration was devoted to the applications of their inherent capabilities on electronics. Here, we report the realization of robust trap effect, which can capture carriers and store them steadily, in two-dimensional MoS(2x)Se(2(1-x)) via synergistic effect of sulphur vacancies and isoelectronic selenium atoms. As a result, infrared detection with very high photoresponsivity (2.4 × 10(5) A W(−1)) and photoswitching ratio (~10(8)), as well as nonvolatile infrared memory with high program/erase ratio (~10(8)) and fast switching time, are achieved just based on an individual flake. This demonstration of defect engineering opens up an avenue for achieving high-performance infrared detector and memory. |
format | Online Article Text |
id | pubmed-6742650 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2019 |
publisher | Nature Publishing Group UK |
record_format | MEDLINE/PubMed |
spelling | pubmed-67426502019-09-16 Robust trap effect in transition metal dichalcogenides for advanced multifunctional devices Yin, Lei He, Peng Cheng, Ruiqing Wang, Feng Wang, Fengmei Wang, Zhenxing Wen, Yao He, Jun Nat Commun Article Defects play a crucial role in determining electric transport properties of two-dimensional transition metal dichalcogenides. In particular, defect-induced deep traps have been demonstrated to possess the ability to capture carriers. However, due to their poor stability and controllability, most studies focus on eliminating this trap effect, and little consideration was devoted to the applications of their inherent capabilities on electronics. Here, we report the realization of robust trap effect, which can capture carriers and store them steadily, in two-dimensional MoS(2x)Se(2(1-x)) via synergistic effect of sulphur vacancies and isoelectronic selenium atoms. As a result, infrared detection with very high photoresponsivity (2.4 × 10(5) A W(−1)) and photoswitching ratio (~10(8)), as well as nonvolatile infrared memory with high program/erase ratio (~10(8)) and fast switching time, are achieved just based on an individual flake. This demonstration of defect engineering opens up an avenue for achieving high-performance infrared detector and memory. Nature Publishing Group UK 2019-09-12 /pmc/articles/PMC6742650/ /pubmed/31515481 http://dx.doi.org/10.1038/s41467-019-12200-x Text en © The Author(s) 2019 Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/. |
spellingShingle | Article Yin, Lei He, Peng Cheng, Ruiqing Wang, Feng Wang, Fengmei Wang, Zhenxing Wen, Yao He, Jun Robust trap effect in transition metal dichalcogenides for advanced multifunctional devices |
title | Robust trap effect in transition metal dichalcogenides for advanced multifunctional devices |
title_full | Robust trap effect in transition metal dichalcogenides for advanced multifunctional devices |
title_fullStr | Robust trap effect in transition metal dichalcogenides for advanced multifunctional devices |
title_full_unstemmed | Robust trap effect in transition metal dichalcogenides for advanced multifunctional devices |
title_short | Robust trap effect in transition metal dichalcogenides for advanced multifunctional devices |
title_sort | robust trap effect in transition metal dichalcogenides for advanced multifunctional devices |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6742650/ https://www.ncbi.nlm.nih.gov/pubmed/31515481 http://dx.doi.org/10.1038/s41467-019-12200-x |
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