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Mesostructured HfO(2)/Al(2)O(3) Composite Thin Films with Reduced Leakage Current for Ion-Conducting Devices
[Image: see text] Mesoporous hafnium dioxide (HfO(2)) thin films (around 20 nm thick) were fabricated by a sol–gel-based spin-coating process, followed by an annealing process at 600 °C to realize the ion-conducting media for the ionics (e.g., Na(+) and K(+) for rechargeable ion batteries). Another...
| Autores principales: | , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
American Chemical Society
2019
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6751548/ https://www.ncbi.nlm.nih.gov/pubmed/31552307 http://dx.doi.org/10.1021/acsomega.9b01095 |