Electrochemical Nanolithography on Silicon: An Easy and Scalable Method to Control Pore Formation at the Nanoscale

Lithography on a sub-100 nm scale is beyond the diffraction limits of standard optical lithography but is nonetheless a key step in many modern technological applications. At this length scale, there are several possible approaches that require either the preliminary surface deposition of materials...

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Detalles Bibliográficos
Autores principales: Pinna, Elisa, Mehrabanian, Mehran, Redolfi Riva, Eugenio, Cara, Eleonora, Aprile, Giulia, Boarino, Luca, Mula, Guido
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2019
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6766228/
https://www.ncbi.nlm.nih.gov/pubmed/31500223
http://dx.doi.org/10.3390/ma12182891

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6766228/
https://www.ncbi.nlm.nih.gov/pubmed/31500223
http://dx.doi.org/10.3390/ma12182891

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