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Electrochemical Nanolithography on Silicon: An Easy and Scalable Method to Control Pore Formation at the Nanoscale
Lithography on a sub-100 nm scale is beyond the diffraction limits of standard optical lithography but is nonetheless a key step in many modern technological applications. At this length scale, there are several possible approaches that require either the preliminary surface deposition of materials...
Autores principales: | , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2019
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6766228/ https://www.ncbi.nlm.nih.gov/pubmed/31500223 http://dx.doi.org/10.3390/ma12182891 |
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author | Pinna, Elisa Mehrabanian, Mehran Redolfi Riva, Eugenio Cara, Eleonora Aprile, Giulia Boarino, Luca Mula, Guido |
author_facet | Pinna, Elisa Mehrabanian, Mehran Redolfi Riva, Eugenio Cara, Eleonora Aprile, Giulia Boarino, Luca Mula, Guido |
author_sort | Pinna, Elisa |
collection | PubMed |
description | Lithography on a sub-100 nm scale is beyond the diffraction limits of standard optical lithography but is nonetheless a key step in many modern technological applications. At this length scale, there are several possible approaches that require either the preliminary surface deposition of materials or the use of expensive and time-consuming techniques. In our approach, we demonstrate a simple process, easily scalable to large surfaces, where the surface patterning that controls pore formation on highly doped silicon wafers is obtained by an electrochemical process. This method joins the advantages of the low cost of an electrochemical approach with its immediate scalability to large wafers. |
format | Online Article Text |
id | pubmed-6766228 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2019 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-67662282019-09-30 Electrochemical Nanolithography on Silicon: An Easy and Scalable Method to Control Pore Formation at the Nanoscale Pinna, Elisa Mehrabanian, Mehran Redolfi Riva, Eugenio Cara, Eleonora Aprile, Giulia Boarino, Luca Mula, Guido Materials (Basel) Article Lithography on a sub-100 nm scale is beyond the diffraction limits of standard optical lithography but is nonetheless a key step in many modern technological applications. At this length scale, there are several possible approaches that require either the preliminary surface deposition of materials or the use of expensive and time-consuming techniques. In our approach, we demonstrate a simple process, easily scalable to large surfaces, where the surface patterning that controls pore formation on highly doped silicon wafers is obtained by an electrochemical process. This method joins the advantages of the low cost of an electrochemical approach with its immediate scalability to large wafers. MDPI 2019-09-07 /pmc/articles/PMC6766228/ /pubmed/31500223 http://dx.doi.org/10.3390/ma12182891 Text en © 2019 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/). |
spellingShingle | Article Pinna, Elisa Mehrabanian, Mehran Redolfi Riva, Eugenio Cara, Eleonora Aprile, Giulia Boarino, Luca Mula, Guido Electrochemical Nanolithography on Silicon: An Easy and Scalable Method to Control Pore Formation at the Nanoscale |
title | Electrochemical Nanolithography on Silicon: An Easy and Scalable Method to Control Pore Formation at the Nanoscale |
title_full | Electrochemical Nanolithography on Silicon: An Easy and Scalable Method to Control Pore Formation at the Nanoscale |
title_fullStr | Electrochemical Nanolithography on Silicon: An Easy and Scalable Method to Control Pore Formation at the Nanoscale |
title_full_unstemmed | Electrochemical Nanolithography on Silicon: An Easy and Scalable Method to Control Pore Formation at the Nanoscale |
title_short | Electrochemical Nanolithography on Silicon: An Easy and Scalable Method to Control Pore Formation at the Nanoscale |
title_sort | electrochemical nanolithography on silicon: an easy and scalable method to control pore formation at the nanoscale |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6766228/ https://www.ncbi.nlm.nih.gov/pubmed/31500223 http://dx.doi.org/10.3390/ma12182891 |
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