Deposition Kinetics of Thin Silica-Like Coatings in a Large Plasma Reactor

An industrial size plasma reactor of 5 m(3) volume was used to study the deposition of silica-like coatings by the plasma-enhanced chemical vapor deposition (PECVD) method. The plasma was sustained by an asymmetrical capacitively coupled radio-frequency discharge at a frequency of 40 kHz and power u...

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Detalles Bibliográficos
Autores principales: Gosar, Žiga, Đonlagić, Denis, Pevec, Simon, Kovač, Janez, Mozetič, Miran, Primc, Gregor, Vesel, Alenka, Zaplotnik, Rok
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2019
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6803826/
https://www.ncbi.nlm.nih.gov/pubmed/31623307
http://dx.doi.org/10.3390/ma12193238

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6803826/
https://www.ncbi.nlm.nih.gov/pubmed/31623307
http://dx.doi.org/10.3390/ma12193238

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