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Deposition Kinetics of Thin Silica-Like Coatings in a Large Plasma Reactor
An industrial size plasma reactor of 5 m(3) volume was used to study the deposition of silica-like coatings by the plasma-enhanced chemical vapor deposition (PECVD) method. The plasma was sustained by an asymmetrical capacitively coupled radio-frequency discharge at a frequency of 40 kHz and power u...
| Autores principales: | , , , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
MDPI
2019
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6803826/ https://www.ncbi.nlm.nih.gov/pubmed/31623307 http://dx.doi.org/10.3390/ma12193238 |