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Dependence of track etching kinetics on chemical reactivity around the ion path

Etching kinetics of swift heavy ions (SHI) tracks in olivine is investigated in frame of experimentally verified numerical approach. The model takes into account variation of induced chemical reactivity of the material around the whole ion trajectory with the nanometric accuracy. This enables a quan...

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Detalles Bibliográficos
Autores principales: Gorbunov, S. A., Rymzhanov, R. A., Volkov, A. E.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2019
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6814710/
https://www.ncbi.nlm.nih.gov/pubmed/31653919
http://dx.doi.org/10.1038/s41598-019-51748-y