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Highly Plasmonic Titanium Nitride by Room-Temperature Sputtering
Titanium nitride (TiN) has recently emerged as an attractive alternative material for plasmonics. However, the typical high-temperature deposition of plasmonic TiN using either sputtering or atomic layer deposition has greatly limited its potential applications and prevented its integration into exi...
| Autores principales: | , , , , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Nature Publishing Group UK
2019
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6814862/ https://www.ncbi.nlm.nih.gov/pubmed/31653881 http://dx.doi.org/10.1038/s41598-019-51236-3 |