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Diamond Etching Beyond 10 μm with Near-Zero Micromasking

To exploit the exceptional properties of diamond, new high quality fabrication techniques are needed to produce high performing devices. Etching and patterning diamond to depths beyond one micron has proven challenging due to the hardness and chemical resistance of diamond. A new cyclic Ar/O(2) - Ar...

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Detalles Bibliográficos
Autores principales: Hicks, Marie-Laure, Pakpour-Tabrizi, Alexander C., Jackman, Richard B.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2019
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6821859/
https://www.ncbi.nlm.nih.gov/pubmed/31666585
http://dx.doi.org/10.1038/s41598-019-51970-8