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Diamond Etching Beyond 10 μm with Near-Zero Micromasking
To exploit the exceptional properties of diamond, new high quality fabrication techniques are needed to produce high performing devices. Etching and patterning diamond to depths beyond one micron has proven challenging due to the hardness and chemical resistance of diamond. A new cyclic Ar/O(2) - Ar...
| Autores principales: | , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Nature Publishing Group UK
2019
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6821859/ https://www.ncbi.nlm.nih.gov/pubmed/31666585 http://dx.doi.org/10.1038/s41598-019-51970-8 |