Fabrication and Evaluation of Trimethylmethoxysilane (TMMOS)-Derived Membranes for Gas Separation

Gas separation membranes were fabricated with varying trimethylmethoxysilane (TMMOS)/tetraethoxy orthosilicate (TEOS) ratios by a chemical vapor deposition (CVD) method at 650 °C and atmospheric pressure. The membrane had a high H(2) permeance of 8.3 × 10(−7) mol m(−2) s(−1) Pa(−1) with H(2)/CH(4) s...

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Detalles Bibliográficos
Autores principales: Mise, Yoshihiro, Ahn, So-Jin, Takagaki, Atsushi, Kikuchi, Ryuji, Oyama, Shigeo Ted
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2019
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6835431/
https://www.ncbi.nlm.nih.gov/pubmed/31547032
http://dx.doi.org/10.3390/membranes9100123

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6835431/
https://www.ncbi.nlm.nih.gov/pubmed/31547032
http://dx.doi.org/10.3390/membranes9100123

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