Pulsed Laser-Assisted Helium Ion Nanomachining of Monolayer Graphene—Direct-Write Kirigami Patterns

A helium gas field ion source has been demonstrated to be capable of realizing higher milling resolution relative to liquid gallium ion sources. One drawback, however, is that the helium ion mass is prohibitively low for reasonable sputtering rates of bulk materials, requiring a dosage that may lead...

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Detalles Bibliográficos
Autores principales: Zhang, Cheng, Dyck, Ondrej, Garfinkel, David A., Stanford, Michael G., Belianinov, Alex A., Fowlkes, Jason D., Jesse, Stephen, Rack, Philip D.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2019
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6835536/
https://www.ncbi.nlm.nih.gov/pubmed/31574915
http://dx.doi.org/10.3390/nano9101394

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6835536/
https://www.ncbi.nlm.nih.gov/pubmed/31574915
http://dx.doi.org/10.3390/nano9101394

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