Formation and Characterization of Hole Nanopattern on Photoresist Layer by Scanning Near-Field Optical Microscope

Patterning of lines of holes on a layer of positive photoresist SX AR-P 3500/6 (Allresist GmbH, Strausberg, Germany) spin-coated on a quartz substrate is carried out by using scanning near-field optical lithography. A green 532 nm-wavelength laser, focused on a backside of a nanoprobe of 90 nm diame...

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Detalles Bibliográficos
Autores principales: Roszkiewicz, Agata, Jain, Amrita, Teodorczyk, Marian, Nasalski, Wojciech
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2019
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6836312/
https://www.ncbi.nlm.nih.gov/pubmed/31614828
http://dx.doi.org/10.3390/nano9101452

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6836312/
https://www.ncbi.nlm.nih.gov/pubmed/31614828
http://dx.doi.org/10.3390/nano9101452

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