Influence of Carrier Gases on the Quality of Epitaxial Corundum-Structured α-Ga(2)O(3) Films Grown by Mist Chemical Vapor Deposition Method

This report systematically investigates the influence of different carrier gases (O(2), N(2), and air) on the growth of gallium oxide (Ga(2)O(3)) thin films on c-plane sapphire substrates by using the mist-CVD method. Although XRD and Raman measurements show that the pure corundum-structured α-Ga(2)...

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Detalles Bibliográficos
Autores principales: Xu, Yu, Zhang, Chunfu, Cheng, Yaolin, Li, Zhe, Cheng, Ya’nan, Feng, Qian, Chen, Dazheng, Zhang, Jincheng, Hao, Yue
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2019
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6888560/
https://www.ncbi.nlm.nih.gov/pubmed/31703363
http://dx.doi.org/10.3390/ma12223670

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6888560/
https://www.ncbi.nlm.nih.gov/pubmed/31703363
http://dx.doi.org/10.3390/ma12223670

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