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Study of Oxidation and Polarization-Dependent Optical Properties of Environmentally Stable Layered GaTe Using a Novel Passivation Approach

Emerging two-dimensional gallium chalcogenides, such as gallium telluride (GaTe), are considered promising layered semiconductors that can serve as vital building blocks towards the implementation of nanodevices in the fields of nanoelectronics, optoelectronics, and quantum photonics. However, oxida...

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Autores principales: Kotha, Mounika, Murray, Thomas, Tuschel, David, Gallis, Spyros
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2019
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6915591/
https://www.ncbi.nlm.nih.gov/pubmed/31652827
http://dx.doi.org/10.3390/nano9111510
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author Kotha, Mounika
Murray, Thomas
Tuschel, David
Gallis, Spyros
author_facet Kotha, Mounika
Murray, Thomas
Tuschel, David
Gallis, Spyros
author_sort Kotha, Mounika
collection PubMed
description Emerging two-dimensional gallium chalcogenides, such as gallium telluride (GaTe), are considered promising layered semiconductors that can serve as vital building blocks towards the implementation of nanodevices in the fields of nanoelectronics, optoelectronics, and quantum photonics. However, oxidation-induced electronic, structural, and optical changes observed in ambient-exposed gallium chalcogenides need to be further investigated and addressed. Herein, we report on the thickness-dependent effect of air exposure on the Raman and photoluminescence (PL) properties of GaTe flakes, with thicknesses spanning in the range of a few layers to 100 nm. We have developed a novel chemical passivation that results in complete encapsulation of the as-exfoliated GaTe flakes in ultrathin hydrogen–silsesquioxane (HSQ) film. A combination of correlation and comparison of Raman and PL studies reveal that the HSQ-capped GaTe flakes are effectively protected from oxidation in air ambient over the studied-period of one year, and thus, preserving their structural and optical characteristics. This contrasts with the behavior of uncapped GaTe, where we observe a significant reduction of the GaTe-related PL (~100×) and Raman (~4×) peak intensities for the few-layered flakes over a period of few days. The time-evolution of the Raman spectra in uncapped GaTe is accompanied by the appearance of two new prominent broad peaks at ~130 cm(−1) and ~146 cm(−1), which are attributed to the formation of polycrystalline tellurium, due to oxidation of ambient-exposed GaTe. Furthermore, and by leveraging this novel passivation, we were able to explore the optical anisotropy of HSQ-capped GaTe flakes. This is caused by the one-dimensional-like nature of the GaTe layer, as the layer comprises Ga–Ga chains extending along the b-axis direction. In concurrence with high-resolution transmission electron microscopy analysis, polarization-dependent PL spectroscopy was used to identify the b-axis crystal direction in HSQ-capped GaTe flakes with various thicknesses over a range of wavelengths (458 nm–633 nm). Thus, our novel surface-passivation offers a new approach to explore and reveal the physical properties of the layered GaTe, with the potential of fabricating reliable polarization-dependent nanophotonics with structural and optical stability.
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spelling pubmed-69155912019-12-24 Study of Oxidation and Polarization-Dependent Optical Properties of Environmentally Stable Layered GaTe Using a Novel Passivation Approach Kotha, Mounika Murray, Thomas Tuschel, David Gallis, Spyros Nanomaterials (Basel) Article Emerging two-dimensional gallium chalcogenides, such as gallium telluride (GaTe), are considered promising layered semiconductors that can serve as vital building blocks towards the implementation of nanodevices in the fields of nanoelectronics, optoelectronics, and quantum photonics. However, oxidation-induced electronic, structural, and optical changes observed in ambient-exposed gallium chalcogenides need to be further investigated and addressed. Herein, we report on the thickness-dependent effect of air exposure on the Raman and photoluminescence (PL) properties of GaTe flakes, with thicknesses spanning in the range of a few layers to 100 nm. We have developed a novel chemical passivation that results in complete encapsulation of the as-exfoliated GaTe flakes in ultrathin hydrogen–silsesquioxane (HSQ) film. A combination of correlation and comparison of Raman and PL studies reveal that the HSQ-capped GaTe flakes are effectively protected from oxidation in air ambient over the studied-period of one year, and thus, preserving their structural and optical characteristics. This contrasts with the behavior of uncapped GaTe, where we observe a significant reduction of the GaTe-related PL (~100×) and Raman (~4×) peak intensities for the few-layered flakes over a period of few days. The time-evolution of the Raman spectra in uncapped GaTe is accompanied by the appearance of two new prominent broad peaks at ~130 cm(−1) and ~146 cm(−1), which are attributed to the formation of polycrystalline tellurium, due to oxidation of ambient-exposed GaTe. Furthermore, and by leveraging this novel passivation, we were able to explore the optical anisotropy of HSQ-capped GaTe flakes. This is caused by the one-dimensional-like nature of the GaTe layer, as the layer comprises Ga–Ga chains extending along the b-axis direction. In concurrence with high-resolution transmission electron microscopy analysis, polarization-dependent PL spectroscopy was used to identify the b-axis crystal direction in HSQ-capped GaTe flakes with various thicknesses over a range of wavelengths (458 nm–633 nm). Thus, our novel surface-passivation offers a new approach to explore and reveal the physical properties of the layered GaTe, with the potential of fabricating reliable polarization-dependent nanophotonics with structural and optical stability. MDPI 2019-10-23 /pmc/articles/PMC6915591/ /pubmed/31652827 http://dx.doi.org/10.3390/nano9111510 Text en © 2019 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Kotha, Mounika
Murray, Thomas
Tuschel, David
Gallis, Spyros
Study of Oxidation and Polarization-Dependent Optical Properties of Environmentally Stable Layered GaTe Using a Novel Passivation Approach
title Study of Oxidation and Polarization-Dependent Optical Properties of Environmentally Stable Layered GaTe Using a Novel Passivation Approach
title_full Study of Oxidation and Polarization-Dependent Optical Properties of Environmentally Stable Layered GaTe Using a Novel Passivation Approach
title_fullStr Study of Oxidation and Polarization-Dependent Optical Properties of Environmentally Stable Layered GaTe Using a Novel Passivation Approach
title_full_unstemmed Study of Oxidation and Polarization-Dependent Optical Properties of Environmentally Stable Layered GaTe Using a Novel Passivation Approach
title_short Study of Oxidation and Polarization-Dependent Optical Properties of Environmentally Stable Layered GaTe Using a Novel Passivation Approach
title_sort study of oxidation and polarization-dependent optical properties of environmentally stable layered gate using a novel passivation approach
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6915591/
https://www.ncbi.nlm.nih.gov/pubmed/31652827
http://dx.doi.org/10.3390/nano9111510
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