Homoepitaxy Growth of Single Crystal Diamond under 300 torr Pressure in the MPCVD System

The high-quality single crystal diamond (SCD) grown in the Microwave Plasma Chemical Vapor Deposition (MPCVD) system was studied. The CVD deposition reaction occurred in a 300 torr high pressure environment on a (100) plane High Pressure High Temperature (HPHT) diamond type II a substrate. The relat...

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Detalles Bibliográficos
Autores principales: Wang, Xiwei, Duan, Peng, Cao, Zhenzhong, Liu, Changjiang, Wang, Dufu, Peng, Yan, Hu, Xiaobo
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2019
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6926801/
https://www.ncbi.nlm.nih.gov/pubmed/31795291
http://dx.doi.org/10.3390/ma12233953

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6926801/
https://www.ncbi.nlm.nih.gov/pubmed/31795291
http://dx.doi.org/10.3390/ma12233953

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