Design of Microdisk-Shaped Ge on Si Photodetector with Recess Structure for Refractive-Index Sensing

In this paper, we introduce a disk-shaped Ge-on-Si photodetector for refractive-index difference sensing at an operating wavelength of 1550 nm. For the implementation of a small-scale sensor, a Ge layer was formed on top of a Si layer to increase the absorption coefficient at the expense of the light-detection area. Additionally, the sensor had a ring waveguide structure along the edge of the disk formed by a recess into the inner part of the disk. This increased the interaction between the dominant optical mode traveling along the edge waveguide and the refractive index of the cladding material to be sensed, and conclusively increased detection sensitivity. The simulation results show that the proposed sensor exhibited a detection sensitivity of >50 nm/RIU (Refractive Index Unit), a quality factor of approximately 3000, and a minimum detectable refractive index change of 0.95 × 10(−2) RIU with a small disk radius of 3 μm. This corresponds to 1.67 times the sensitivity without a recess (>30 nm/RIU).