Reverse Problem in Surface Texture Analysis—One-Process Profile Modeling on the Basis of Measured Two-Process Profile after Machining or Wear

The method of the base (valley) one-process profile modeling on the basis of the measured two-process profile was developed. The base one-process random profile of the Gaussian ordinate distribution is characterized by the standard deviation of the profile height and the correlation length. The prob...

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Detalles Bibliográficos
Autores principales: Pawlus, Pawel, Reizer, Rafal, Wieczorowski, Michal
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2019
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6947491/
https://www.ncbi.nlm.nih.gov/pubmed/31842261
http://dx.doi.org/10.3390/ma12244169

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6947491/
https://www.ncbi.nlm.nih.gov/pubmed/31842261
http://dx.doi.org/10.3390/ma12244169

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