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Reverse Problem in Surface Texture Analysis—One-Process Profile Modeling on the Basis of Measured Two-Process Profile after Machining or Wear
The method of the base (valley) one-process profile modeling on the basis of the measured two-process profile was developed. The base one-process random profile of the Gaussian ordinate distribution is characterized by the standard deviation of the profile height and the correlation length. The prob...
Autores principales: | , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2019
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6947491/ https://www.ncbi.nlm.nih.gov/pubmed/31842261 http://dx.doi.org/10.3390/ma12244169 |
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author | Pawlus, Pawel Reizer, Rafal Wieczorowski, Michal |
author_facet | Pawlus, Pawel Reizer, Rafal Wieczorowski, Michal |
author_sort | Pawlus, Pawel |
collection | PubMed |
description | The method of the base (valley) one-process profile modeling on the basis of the measured two-process profile was developed. The base one-process random profile of the Gaussian ordinate distribution is characterized by the standard deviation of the profile height and the correlation length. The problem of estimation of the correlation length of this one-process profile exists. In the procedure of the correlation length estimation, information about the averaged shape of the autocorrelation functions of many one-process profiles after the same type of machining is required. The correlation length of the base one-process profile can be obtained on the basis of the vertical truncation of the measured two-process profile. The average error of the correlation length estimation was not higher than 7%, while the maximum error was not larger than 14%. This method can be extended to simulate the one-process texture of 3D (areal) surface topography. |
format | Online Article Text |
id | pubmed-6947491 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2019 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-69474912020-01-13 Reverse Problem in Surface Texture Analysis—One-Process Profile Modeling on the Basis of Measured Two-Process Profile after Machining or Wear Pawlus, Pawel Reizer, Rafal Wieczorowski, Michal Materials (Basel) Article The method of the base (valley) one-process profile modeling on the basis of the measured two-process profile was developed. The base one-process random profile of the Gaussian ordinate distribution is characterized by the standard deviation of the profile height and the correlation length. The problem of estimation of the correlation length of this one-process profile exists. In the procedure of the correlation length estimation, information about the averaged shape of the autocorrelation functions of many one-process profiles after the same type of machining is required. The correlation length of the base one-process profile can be obtained on the basis of the vertical truncation of the measured two-process profile. The average error of the correlation length estimation was not higher than 7%, while the maximum error was not larger than 14%. This method can be extended to simulate the one-process texture of 3D (areal) surface topography. MDPI 2019-12-12 /pmc/articles/PMC6947491/ /pubmed/31842261 http://dx.doi.org/10.3390/ma12244169 Text en © 2019 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/). |
spellingShingle | Article Pawlus, Pawel Reizer, Rafal Wieczorowski, Michal Reverse Problem in Surface Texture Analysis—One-Process Profile Modeling on the Basis of Measured Two-Process Profile after Machining or Wear |
title | Reverse Problem in Surface Texture Analysis—One-Process Profile Modeling on the Basis of Measured Two-Process Profile after Machining or Wear |
title_full | Reverse Problem in Surface Texture Analysis—One-Process Profile Modeling on the Basis of Measured Two-Process Profile after Machining or Wear |
title_fullStr | Reverse Problem in Surface Texture Analysis—One-Process Profile Modeling on the Basis of Measured Two-Process Profile after Machining or Wear |
title_full_unstemmed | Reverse Problem in Surface Texture Analysis—One-Process Profile Modeling on the Basis of Measured Two-Process Profile after Machining or Wear |
title_short | Reverse Problem in Surface Texture Analysis—One-Process Profile Modeling on the Basis of Measured Two-Process Profile after Machining or Wear |
title_sort | reverse problem in surface texture analysis—one-process profile modeling on the basis of measured two-process profile after machining or wear |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6947491/ https://www.ncbi.nlm.nih.gov/pubmed/31842261 http://dx.doi.org/10.3390/ma12244169 |
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