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Reverse Problem in Surface Texture Analysis—One-Process Profile Modeling on the Basis of Measured Two-Process Profile after Machining or Wear
The method of the base (valley) one-process profile modeling on the basis of the measured two-process profile was developed. The base one-process random profile of the Gaussian ordinate distribution is characterized by the standard deviation of the profile height and the correlation length. The prob...
| Autores principales: | , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
MDPI
2019
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6947491/ https://www.ncbi.nlm.nih.gov/pubmed/31842261 http://dx.doi.org/10.3390/ma12244169 |