Measuring energy-dependent photoelectron escape in microcrystals

With the increasing trend of using microcrystals and intense microbeams at synchrotron X-ray beamlines, radiation damage becomes a more pressing problem. Theoretical calculations show that the photoelectrons that primarily cause damage can escape microcrystals. This effect would become more pronounc...

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Detalles Bibliográficos
Autores principales: Storm, Selina L. S., Crawshaw, Adam D., Devenish, Nicholas E., Bolton, Rachel, Hall, David R., Tews, Ivo, Evans, Gwyndaf
Formato: Online Artículo Texto
Lenguaje:English
Publicado: International Union of Crystallography 2020
Materias:
Research Papers
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6949606/
https://www.ncbi.nlm.nih.gov/pubmed/31949913
http://dx.doi.org/10.1107/S2052252519016178

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6949606/
https://www.ncbi.nlm.nih.gov/pubmed/31949913
http://dx.doi.org/10.1107/S2052252519016178

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