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Investigation of the Pd Nanoparticles-Assisted Chemical Etching of Silicon for Ethanol Solution Electrooxidation

The formation of porous silicon by Pd nanoparticles-assisted chemical etching of single-crystal Si with resistivity ρ = 0.01 Ω·cm at 25 °C, 50 °C and 75 °C in HF/H(2)O(2)/H(2)O solution was studied. Porous layers of silicon were studied by optical and scanning electron microscopy, and gravimetric an...

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Detalles Bibliográficos
Autores principales: Volovlikova, Olga, Silakov, Gennady, Gavrilov, Sergey, Maniecki, Tomasz, Dudin, Alexander
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2019
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6952961/
https://www.ncbi.nlm.nih.gov/pubmed/31842302
http://dx.doi.org/10.3390/mi10120872