Near-field sub-diffraction photolithography with an elastomeric photomask

Photolithography is the prevalent microfabrication technology. It needs to meet resolution and yield demands at a cost that makes it economically viable. However, conventional far-field photolithography has reached the diffraction limit, which imposes complex optics and short-wavelength beam source...

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Detalles Bibliográficos
Autores principales: Paik, Sangyoon, Kim, Gwangmook, Chang, Sehwan, Lee, Sooun, Jin, Dana, Jeong, Kwang-Yong, Lee, I Sak, Lee, Jekwan, Moon, Hongjae, Lee, Jaejun, Chang, Kiseok, Choi, Su Seok, Moon, Jeongmin, Jung, Soonshin, Kang, Shinill, Lee, Wooyoung, Choi, Heon-Jin, Choi, Hyunyong, Kim, Hyun Jae, Lee, Jae-Hyun, Cheon, Jinwoo, Kim, Miso, Myoung, Jaemin, Park, Hong-Gyu, Shim, Wooyoung
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2020
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7010681/
https://www.ncbi.nlm.nih.gov/pubmed/32041949
http://dx.doi.org/10.1038/s41467-020-14439-1

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7010681/
https://www.ncbi.nlm.nih.gov/pubmed/32041949
http://dx.doi.org/10.1038/s41467-020-14439-1

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