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Diamond lateral FinFET with triode-like behavior

In this letter we report a diamond lateral FinFET fabricated using an ohmic regrowth technique. The use of ohmic regrowth separates the source/drain and gate fabrication, providing a viable means to improve ohmic contact resistance while protecting the top surface of the diamond channel from dry etc...

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Detalles Bibliográficos
Autores principales: Huang, Biqin, Bai, Xiwei, Lam, Stephen K., Kim, Samuel J.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2020
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7010734/
https://www.ncbi.nlm.nih.gov/pubmed/32042009
http://dx.doi.org/10.1038/s41598-020-59049-5