In Situ Doping of Nitrogen in <110>-Oriented Bulk 3C-SiC by Halide Laser Chemical Vapour Deposition

Doping of nitrogen is a promising approach to improve the electrical conductivity of 3C-SiC and allow its application in various fields. N-doped, <110>-oriented 3C-SiC bulks with different doping concentrations were prepared via halide laser chemical vapour deposition (HLCVD) using tetrachlorosilane (SiCl(4)) and methane (CH(4)) as precursors, along with nitrogen (N(2)) as a dopant. We investigated the effect of the volume fraction of nitrogen (ϕ(N2)) on the preferred orientation, microstructure, electrical conductivity (σ), deposition rate (R(dep)), and optical transmittance. The preference of 3C-SiC for the <110> orientation increased with increasing ϕ(N2). The σ value of the N-doped 3C-SiC bulk substrates first increased and then decreased with increasing ϕ(N2), reaching a maximum value of 7.4 × 10(2) S/m at ϕ(N2) = 20%. R(dep) showed its highest value (3000 μm/h) for the undoped sample and decreased with increasing ϕ(N2), reaching 1437 μm/h at ϕ(N2) = 30%. The transmittance of the N-doped 3C-SiC bulks decreased with ϕ(N2) and showed a declining trend at wavelengths longer than 1000 nm. Compared with the previously prepared <111>-oriented N-doped 3C-SiC, the high-speed preparation of <110>-oriented N-doped 3C-SiC bulks further broadens its application field.