Influence of Thickness and Sputtering Pressure on Electrical Resistivity and Elastic Wave Propagation in Oriented Columnar Tungsten Thin Films

Tungsten films were prepared by DC magnetron sputtering using glancing angle deposition with a constant deposition angle α = 80°. A first series of films was obtained at a constant pressure of 4.0 × 10(−3) mbar with the films’ thickness increasing from 50 to 1000 nm. A second series was produced wit...

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Detalles Bibliográficos
Autores principales: Chargui, Asma, El Beainou, Raya, Mosset, Alexis, Euphrasie, Sébastien, Potin, Valérie, Vairac, Pascal, Martin, Nicolas
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2020
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7022766/
https://www.ncbi.nlm.nih.gov/pubmed/31906311
http://dx.doi.org/10.3390/nano10010081

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7022766/
https://www.ncbi.nlm.nih.gov/pubmed/31906311
http://dx.doi.org/10.3390/nano10010081

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