Cooperative particle rearrangements facilitate the self-organized growth of colloidal crystal arrays on strain-relief patterns

Strain-relief pattern formation in heteroepitaxy is well understood for particles with long-range attraction and is a routinely exploited organizational principle for atoms and molecules. However, for particles with short-range attraction such as colloids and nanoparticles, which form brittle assemb...

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Detalles Bibliográficos
Autores principales: Mondal, Manodeep, Mishra, Chandan K., Banerjee, Rajdeep, Narasimhan, Shobhana, Sood, A. K., Ganapathy, Rajesh
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Association for the Advancement of Science 2020
Materias:
Research Articles
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7056312/
https://www.ncbi.nlm.nih.gov/pubmed/32181352
http://dx.doi.org/10.1126/sciadv.aay8418

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7056312/
https://www.ncbi.nlm.nih.gov/pubmed/32181352
http://dx.doi.org/10.1126/sciadv.aay8418

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