High dielectric ternary oxides from crystal structure prediction and high-throughput screening

The development of new high dielectric materials is essential for advancement in modern electronics. Oxides are generally regarded as the most promising class of high dielectric materials for industrial applications as they possess both high dielectric constants and large band gaps. Most previous re...

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Detalles Bibliográficos
Autores principales: Qu, Jingyu, Zagaceta, David, Zhang, Weiwei, Zhu, Qiang
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2020
Materias:
Data Descriptor
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7060264/
https://www.ncbi.nlm.nih.gov/pubmed/32144269
http://dx.doi.org/10.1038/s41597-020-0418-6

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7060264/
https://www.ncbi.nlm.nih.gov/pubmed/32144269
http://dx.doi.org/10.1038/s41597-020-0418-6

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