Thermal Stability of Octadecyltrichlorosilane and Perfluorooctyltriethoxysilane Monolayers on SiO(2)

Using in situ ultraviolet photoelectron spectroscopy (UPS) and X-ray photoelectron spectroscopy (XPS) measurements, the thermal behavior of octadecyltrichlorosilane (OTS) and 1H, 1H, 2H, and 2H-perfluorooctyltriethoxysilane (PTES) monolayers on SiO(2) substrates has been investigated. OTS is thermal...

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Detalles Bibliográficos
Autores principales: Yang, Xiangdong, Wang, Haitao, Wang, Peng, Yang, Xuxin, Mao, Hongying
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2020
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7074835/
https://www.ncbi.nlm.nih.gov/pubmed/31991854
http://dx.doi.org/10.3390/nano10020210

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7074835/
https://www.ncbi.nlm.nih.gov/pubmed/31991854
http://dx.doi.org/10.3390/nano10020210

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