Thermal Stability of Octadecyltrichlorosilane and Perfluorooctyltriethoxysilane Monolayers on SiO(2)

Using in situ ultraviolet photoelectron spectroscopy (UPS) and X-ray photoelectron spectroscopy (XPS) measurements, the thermal behavior of octadecyltrichlorosilane (OTS) and 1H, 1H, 2H, and 2H-perfluorooctyltriethoxysilane (PTES) monolayers on SiO(2) substrates has been investigated. OTS is thermal...

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Detalles Bibliográficos
Autores principales: Yang, Xiangdong, Wang, Haitao, Wang, Peng, Yang, Xuxin, Mao, Hongying
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2020
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7074835/
https://www.ncbi.nlm.nih.gov/pubmed/31991854
http://dx.doi.org/10.3390/nano10020210
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author Yang, Xiangdong
Wang, Haitao
Wang, Peng
Yang, Xuxin
Mao, Hongying
author_facet Yang, Xiangdong
Wang, Haitao
Wang, Peng
Yang, Xuxin
Mao, Hongying
author_sort Yang, Xiangdong
collection PubMed
description Using in situ ultraviolet photoelectron spectroscopy (UPS) and X-ray photoelectron spectroscopy (XPS) measurements, the thermal behavior of octadecyltrichlorosilane (OTS) and 1H, 1H, 2H, and 2H-perfluorooctyltriethoxysilane (PTES) monolayers on SiO(2) substrates has been investigated. OTS is thermally stable up to 573 K with vacuum annealing, whereas PTES starts decomposing at a moderate temperature between 373 K and 423 K. Vacuum annealing results in the decomposition of CF(3) and CF(2) species rather than desorption of the entire PTES molecule. In addition, our UPS results reveal that the work function (WF)of OTS remains the same after annealing; however WF of PTES decreases from ~5.62 eV to ~5.16 eV after annealing at 573 K.
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spelling pubmed-70748352020-03-20 Thermal Stability of Octadecyltrichlorosilane and Perfluorooctyltriethoxysilane Monolayers on SiO(2) Yang, Xiangdong Wang, Haitao Wang, Peng Yang, Xuxin Mao, Hongying Nanomaterials (Basel) Article Using in situ ultraviolet photoelectron spectroscopy (UPS) and X-ray photoelectron spectroscopy (XPS) measurements, the thermal behavior of octadecyltrichlorosilane (OTS) and 1H, 1H, 2H, and 2H-perfluorooctyltriethoxysilane (PTES) monolayers on SiO(2) substrates has been investigated. OTS is thermally stable up to 573 K with vacuum annealing, whereas PTES starts decomposing at a moderate temperature between 373 K and 423 K. Vacuum annealing results in the decomposition of CF(3) and CF(2) species rather than desorption of the entire PTES molecule. In addition, our UPS results reveal that the work function (WF)of OTS remains the same after annealing; however WF of PTES decreases from ~5.62 eV to ~5.16 eV after annealing at 573 K. MDPI 2020-01-26 /pmc/articles/PMC7074835/ /pubmed/31991854 http://dx.doi.org/10.3390/nano10020210 Text en © 2020 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Yang, Xiangdong
Wang, Haitao
Wang, Peng
Yang, Xuxin
Mao, Hongying
Thermal Stability of Octadecyltrichlorosilane and Perfluorooctyltriethoxysilane Monolayers on SiO(2)
title Thermal Stability of Octadecyltrichlorosilane and Perfluorooctyltriethoxysilane Monolayers on SiO(2)
title_full Thermal Stability of Octadecyltrichlorosilane and Perfluorooctyltriethoxysilane Monolayers on SiO(2)
title_fullStr Thermal Stability of Octadecyltrichlorosilane and Perfluorooctyltriethoxysilane Monolayers on SiO(2)
title_full_unstemmed Thermal Stability of Octadecyltrichlorosilane and Perfluorooctyltriethoxysilane Monolayers on SiO(2)
title_short Thermal Stability of Octadecyltrichlorosilane and Perfluorooctyltriethoxysilane Monolayers on SiO(2)
title_sort thermal stability of octadecyltrichlorosilane and perfluorooctyltriethoxysilane monolayers on sio(2)
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7074835/
https://www.ncbi.nlm.nih.gov/pubmed/31991854
http://dx.doi.org/10.3390/nano10020210
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