Morphology-Graded Silicon Nanowire Arrays via Chemical Etching: Engineering Optical Properties at the Nanoscale and Macroscale

[Image: see text] We report on a quick, simple, and cost-effective solution-phase approach to prepare centimeter-sized morphology-graded vertically aligned Si nanowire arrays. Gradients in the nanowire diameter and shape are encoded through the macroscale substrate via a “dip-etching” approach, wher...

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Detalles Bibliográficos
Autores principales: Wendisch, Fedja J., Abazari, Mehri, Mahdavi, Hossein, Rey, Marcel, Vogel, Nicolas, Musso, Maurizio, Diwald, Oliver, Bourret, Gilles R.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2020
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7082793/
https://www.ncbi.nlm.nih.gov/pubmed/32129591
http://dx.doi.org/10.1021/acsami.9b21466

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7082793/
https://www.ncbi.nlm.nih.gov/pubmed/32129591
http://dx.doi.org/10.1021/acsami.9b21466

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