Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH(3)

Transition metal nitrides, like titanium nitride (TiN), are promising alternative plasmonic materials. Here we demonstrate a low temperature plasma-enhanced atomic layer deposition (PE-ALD) of non-stoichiometric TiN(0.71) on lattice-matched and -mismatched substrates. The TiN was found to be optical...

Descripción completa

Detalles Bibliográficos
Autores principales: Hansen, Katherine, Cardona, Melissa, Dutta, Amartya, Yang, Chen
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2020
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7084610/
https://www.ncbi.nlm.nih.gov/pubmed/32120834
http://dx.doi.org/10.3390/ma13051058

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7084610/
https://www.ncbi.nlm.nih.gov/pubmed/32120834
http://dx.doi.org/10.3390/ma13051058

Ejemplares similares