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Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH(3)

Transition metal nitrides, like titanium nitride (TiN), are promising alternative plasmonic materials. Here we demonstrate a low temperature plasma-enhanced atomic layer deposition (PE-ALD) of non-stoichiometric TiN(0.71) on lattice-matched and -mismatched substrates. The TiN was found to be optical...

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Detalles Bibliográficos
Autores principales:	Hansen, Katherine, Cardona, Melissa, Dutta, Amartya, Yang, Chen
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	MDPI 2020
Materias:	Article
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7084610/ https://www.ncbi.nlm.nih.gov/pubmed/32120834 http://dx.doi.org/10.3390/ma13051058

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