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Interfacial effects on leakage currents in Cu/α-cristobalite/Cu junctions

As the miniaturization trend of integrated circuit continues, the leakage currents flow through the dielectric films insulating the interconnects become a critical issue. However, quantum transport through the mainstream on-chip interfaces between interconnects and dielectrics has not been addressed...

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Detalles Bibliográficos
Autores principales: Lin, Kuan-Bo, Su, Yen-Hsun, Kaun, Chao-Cheng
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2020
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7093521/
https://www.ncbi.nlm.nih.gov/pubmed/32210324
http://dx.doi.org/10.1038/s41598-020-62356-6