Cargando…
A Comparative Study on the Ferroelectric Performances in Atomic Layer Deposited Hf(0.5)Zr(0.5)O(2) Thin Films Using Tetrakis(ethylmethylamino) and Tetrakis(dimethylamino) Precursors
The chemical, physical, and electrical properties of the atomic layer deposited Hf(0.5)Zr(0.5)O(2) thin films using tetrakis(ethylmethylamino) (TEMA) and tetrakis(dimethylamino) (TDMA) precursors are compared. The ligand of the metal-organic precursors strongly affects the residual C concentration,...
Autores principales: | Kim, Baek Su, Hyun, Seung Dam, Moon, Taehwan, Do Kim, Keum, Lee, Young Hwan, Park, Hyeon Woo, Lee, Yong Bin, Roh, Jangho, Kim, Beom Yong, Kim, Ho Hyun, Park, Min Hyuk, Hwang, Cheol Seong |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Springer US
2020
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7138889/ https://www.ncbi.nlm.nih.gov/pubmed/32266598 http://dx.doi.org/10.1186/s11671-020-03301-4 |
Ejemplares similares
-
Interface-engineered ferroelectricity of epitaxial Hf(0.5)Zr(0.5)O(2) thin films
por: Shi, Shu, et al.
Publicado: (2023) -
Wake-Up Free Ultrathin Ferroelectric Hf(0.5)Zr(0.5)O(2) Films
por: Chouprik, Anastasia, et al.
Publicado: (2023) -
Nanoscale Doping and Its Impact on the Ferroelectric and Piezoelectric Properties of Hf(0.5)Zr(0.5)O(2)
por: Chouprik, Anastasia, et al.
Publicado: (2022) -
Improved Ferroelectric Properties in Hf(0.5)Zr(0.5)O(2) Thin Films by Microwave Annealing
por: Zhao, Biyao, et al.
Publicado: (2022) -
Improved Endurance of Ferroelectric Hf(0.5)Zr(0.5)O(2) Using Laminated-Structure Interlayer
por: Chen, Meiwen, et al.
Publicado: (2023)