Effects of Ion Beam Etching on the Nanoscale Damage Precursor Evolution of Fused Silica

Nanoscale laser damage precursors generated from fabrication have emerged as a new bottleneck that limits the laser damage resistance improvement of fused silica optics. In this paper, ion beam etching (IBE) technology is performed to investigate the evolutions of some nanoscale damage precursors (s...

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Detalles Bibliográficos
Autores principales: Zhong, Yaoyu, Dai, Yifan, Shi, Feng, Song, Ci, Tian, Ye, Lin, Zhifan, Zhang, Wanli, Shen, Yongxiang
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2020
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7143300/
https://www.ncbi.nlm.nih.gov/pubmed/32182972
http://dx.doi.org/10.3390/ma13061294

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7143300/
https://www.ncbi.nlm.nih.gov/pubmed/32182972
http://dx.doi.org/10.3390/ma13061294

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