Atmospheric Pressure Plasma Deposition of Organosilicon Thin Films by Direct Current and Radio-frequency Plasma Jets

Thin film deposition with atmospheric pressure plasmas is highly interesting for industrial demands and scientific interests in the field of biomaterials. However, the engineering of high-quality films by high-pressure plasmas with precise control over morphology and surface chemistry still poses a...

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Detalles Bibliográficos
Autores principales: Kuchakova, Iryna, Ionita, Maria Daniela, Ionita, Eusebiu-Rosini, Lazea-Stoyanova, Andrada, Brajnicov, Simona, Mitu, Bogdana, Dinescu, Gheorghe, De Vrieze, Mike, Cvelbar, Uroš, Zille, Andrea, Leys, Christophe, Yu Nikiforov, Anton
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2020
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7143598/
https://www.ncbi.nlm.nih.gov/pubmed/32183006
http://dx.doi.org/10.3390/ma13061296

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7143598/
https://www.ncbi.nlm.nih.gov/pubmed/32183006
http://dx.doi.org/10.3390/ma13061296

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