Pulsed Laser Deposition of Bismuth Vanadate Thin Films—The Effect of Oxygen Pressure on the Morphology, Composition, and Photoelectrochemical Performance

Thin layers of bismuth vanadate were deposited using the pulsed laser deposition technique on commercially available FTO (fluorine-doped tin oxide) substrates. Films were sputtered from a sintered, monoclinic BiVO(4) pellet, acting as the target, under various oxygen pressures (from 0.1 to 2 mbar),...

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Detalles Bibliográficos
Autores principales: Trzciński, Konrad, Szkoda, Mariusz, Gazda, Maria, Karczewski, Jakub, Cenian, Adam, Grigorian, Galina M., Sawczak, Mirosław
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2020
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7143622/
https://www.ncbi.nlm.nih.gov/pubmed/32192186
http://dx.doi.org/10.3390/ma13061360

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7143622/
https://www.ncbi.nlm.nih.gov/pubmed/32192186
http://dx.doi.org/10.3390/ma13061360

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