Use of Two-Photon Lithography with a Negative Resist and Processing to Realise Cylindrical Magnetic Nanowires

Cylindrical magnetic nanowires have been shown to exhibit a vast array of fascinating spin textures, including chiral domains, skyrmion tubes, and topologically protected domain walls that harbor Bloch points. Here, we present a novel methodology that utilizes two-photon lithography in order to real...

Descripción completa

Detalles Bibliográficos
Autores principales: Askey, Joseph, Hunt, Matthew Oliver, Langbein, Wolfgang, Ladak, Sam
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2020
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7152837/
https://www.ncbi.nlm.nih.gov/pubmed/32121262
http://dx.doi.org/10.3390/nano10030429

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7152837/
https://www.ncbi.nlm.nih.gov/pubmed/32121262
http://dx.doi.org/10.3390/nano10030429

Ejemplares similares