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Use of Two-Photon Lithography with a Negative Resist and Processing to Realise Cylindrical Magnetic Nanowires
Cylindrical magnetic nanowires have been shown to exhibit a vast array of fascinating spin textures, including chiral domains, skyrmion tubes, and topologically protected domain walls that harbor Bloch points. Here, we present a novel methodology that utilizes two-photon lithography in order to real...
| Autores principales: | , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
MDPI
2020
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7152837/ https://www.ncbi.nlm.nih.gov/pubmed/32121262 http://dx.doi.org/10.3390/nano10030429 |