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Dataset for the comparison of vacuum-treated and as-etched porous silicon samples in terms of the evolution of oxidation at low temperatures

The development of chemical sensors made from porous silicon is a task that has been addressed for several years. In order to have a reliable sensing material, stability must be guaranteed. Oxidation in silicon degrades the sensing capability. The data presented in this article provides some importa...

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Detalles Bibliográficos
Autores principales: Ramírez-Porras, Arturo, Allen, Kevin, Pereira-Cubillo, Juan S.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Elsevier 2020
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7160521/
https://www.ncbi.nlm.nih.gov/pubmed/32322623
http://dx.doi.org/10.1016/j.dib.2020.105475
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author Ramírez-Porras, Arturo
Allen, Kevin
Pereira-Cubillo, Juan S.
author_facet Ramírez-Porras, Arturo
Allen, Kevin
Pereira-Cubillo, Juan S.
author_sort Ramírez-Porras, Arturo
collection PubMed
description The development of chemical sensors made from porous silicon is a task that has been addressed for several years. In order to have a reliable sensing material, stability must be guaranteed. Oxidation in silicon degrades the sensing capability. The data presented in this article provides some important insights concerning the treatment of samples that can improve the material stability against oxidation. For this purpose, Fourier Transformed Infrared (FTIR) measurements using an Attenuated Total Reflectance (ATR) additament were employed to extract information concerning oxidation on the samples submitted to different temperatures. Photoluminescent (PL) measurements were also performed on the samples in order to extract information on nanocrystals sizes and their relationship with oxidation.
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spelling pubmed-71605212020-04-22 Dataset for the comparison of vacuum-treated and as-etched porous silicon samples in terms of the evolution of oxidation at low temperatures Ramírez-Porras, Arturo Allen, Kevin Pereira-Cubillo, Juan S. Data Brief Materials Science The development of chemical sensors made from porous silicon is a task that has been addressed for several years. In order to have a reliable sensing material, stability must be guaranteed. Oxidation in silicon degrades the sensing capability. The data presented in this article provides some important insights concerning the treatment of samples that can improve the material stability against oxidation. For this purpose, Fourier Transformed Infrared (FTIR) measurements using an Attenuated Total Reflectance (ATR) additament were employed to extract information concerning oxidation on the samples submitted to different temperatures. Photoluminescent (PL) measurements were also performed on the samples in order to extract information on nanocrystals sizes and their relationship with oxidation. Elsevier 2020-04-08 /pmc/articles/PMC7160521/ /pubmed/32322623 http://dx.doi.org/10.1016/j.dib.2020.105475 Text en © 2020 The Author(s) http://creativecommons.org/licenses/by/4.0/ This is an open access article under the CC BY license (http://creativecommons.org/licenses/by/4.0/).
spellingShingle Materials Science
Ramírez-Porras, Arturo
Allen, Kevin
Pereira-Cubillo, Juan S.
Dataset for the comparison of vacuum-treated and as-etched porous silicon samples in terms of the evolution of oxidation at low temperatures
title Dataset for the comparison of vacuum-treated and as-etched porous silicon samples in terms of the evolution of oxidation at low temperatures
title_full Dataset for the comparison of vacuum-treated and as-etched porous silicon samples in terms of the evolution of oxidation at low temperatures
title_fullStr Dataset for the comparison of vacuum-treated and as-etched porous silicon samples in terms of the evolution of oxidation at low temperatures
title_full_unstemmed Dataset for the comparison of vacuum-treated and as-etched porous silicon samples in terms of the evolution of oxidation at low temperatures
title_short Dataset for the comparison of vacuum-treated and as-etched porous silicon samples in terms of the evolution of oxidation at low temperatures
title_sort dataset for the comparison of vacuum-treated and as-etched porous silicon samples in terms of the evolution of oxidation at low temperatures
topic Materials Science
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7160521/
https://www.ncbi.nlm.nih.gov/pubmed/32322623
http://dx.doi.org/10.1016/j.dib.2020.105475
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