Atomic force microscopy data of novel high-k hydrocarbon films synthesized on Si wafers for gate dielectric applications

This article presents data obtained from the atomic force microscopy (AFM) images of ultrathin high-k hydrocarbon (HC) films. The high-k HC films were synthesized on Si(100) wafers at various growth temperatures by using inductively-coupled plasma chemical vapor deposition with CH(4) gas and a gas m...

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Detalles Bibliográficos
Autores principales: Kwon, Jihwan, Kim, Dong-Ok, Lee, Sangyeob, Kim, Eui-Tae
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Elsevier 2020
Materias:
Materials Science
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7206205/
https://www.ncbi.nlm.nih.gov/pubmed/32395596
http://dx.doi.org/10.1016/j.dib.2020.105652

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7206205/
https://www.ncbi.nlm.nih.gov/pubmed/32395596
http://dx.doi.org/10.1016/j.dib.2020.105652

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