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Piezoelectric BiFeO(3) Thin Films: Optimization of MOCVD Process on Si

This paper presents a simple and optimized metal organic chemical vapor deposition (MOCVD) protocol for the deposition of perovskite BiFeO(3) films on silicon-based substrates, in order to move toward the next generation of lead-free hybrid energy harvesters. A bi-metal mixture that is composed of B...

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Detalles Bibliográficos
Autores principales:	Micard, Quentin, Condorelli, Guglielmo Guido, Malandrino, Graziella
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	MDPI 2020
Materias:	Article
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7221529/ https://www.ncbi.nlm.nih.gov/pubmed/32231101 http://dx.doi.org/10.3390/nano10040630

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