Formation of Thin NiGe Films by Magnetron Sputtering and Flash Lamp Annealing

The nickel monogermanide (NiGe) phase is known for its electrical properties such as low ohmic and low contact resistance in group-IV-based electronics. In this work, thin films of nickel germanides (Ni–Ge) were formed by magnetron sputtering followed by flash lamp annealing (FLA). The formation of...

Descripción completa

Detalles Bibliográficos
Autores principales: Begeza, Viktor, Mehner, Erik, Stöcker, Hartmut, Xie, Yufang, García, Alejandro, Hübner, Rene, Erb, Denise, Zhou, Shengqiang, Rebohle, Lars
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2020
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7221967/
https://www.ncbi.nlm.nih.gov/pubmed/32244356
http://dx.doi.org/10.3390/nano10040648

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7221967/
https://www.ncbi.nlm.nih.gov/pubmed/32244356
http://dx.doi.org/10.3390/nano10040648

Ejemplares similares