Fabrication of Ultra-High Aspect Ratio (>420:1) Al(2)O(3) Nanotube Arraysby Sidewall TransferMetal Assistant Chemical Etching

We report a robust, sidewall transfer metal assistant chemical etching scheme for fabricating Al(2)O(3) nanotube arrays with an ultra-high aspect ratio. Electron beam lithography followed by low-temperature Au metal assisted chemical etching (MacEtch) is used to pattern high resolution, high aspect...

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Detalles Bibliográficos
Autores principales: Li, Hailiang, Xie, Changqing
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2020
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7230905/
https://www.ncbi.nlm.nih.gov/pubmed/32260150
http://dx.doi.org/10.3390/mi11040378

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7230905/
https://www.ncbi.nlm.nih.gov/pubmed/32260150
http://dx.doi.org/10.3390/mi11040378

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