Cargando…
Fabrication of Ultra-High Aspect Ratio (>420:1) Al(2)O(3) Nanotube Arraysby Sidewall TransferMetal Assistant Chemical Etching
We report a robust, sidewall transfer metal assistant chemical etching scheme for fabricating Al(2)O(3) nanotube arrays with an ultra-high aspect ratio. Electron beam lithography followed by low-temperature Au metal assisted chemical etching (MacEtch) is used to pattern high resolution, high aspect...
Autores principales: | Li, Hailiang, Xie, Changqing |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2020
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7230905/ https://www.ncbi.nlm.nih.gov/pubmed/32260150 http://dx.doi.org/10.3390/mi11040378 |
Ejemplares similares
-
Wafer-Scale Fabrication of Ultra-High Aspect Ratio, Microscale Silicon Structures with Smooth Sidewalls Using Metal Assisted Chemical Etching
por: Zhang, Xiaomeng, et al.
Publicado: (2023) -
Rapid Fabrication of High-Aspect-Ratio Platinum Microprobes by Electrochemical Discharge Etching
por: Zhang, Min, et al.
Publicado: (2016) -
Towards the Fabrication of High-Aspect-Ratio Silicon Gratings by Deep Reactive Ion Etching
por: Shi, Zhitian, et al.
Publicado: (2020) -
Voltammetric Evidence
of Proton Transport through
the Sidewalls of Single-Walled Carbon Nanotubes
por: Jordan, Jack W., et al.
Publicado: (2023) -
Reduced Etch Lag and High Aspect Ratios by Deep Reactive Ion Etching (DRIE)
por: Gerlt, Michael S., et al.
Publicado: (2021)