Cargando…

Structural, Optical and Electrical Properties of HfO(2) Thin Films Deposited at Low-Temperature Using Plasma-Enhanced Atomic Layer Deposition

HfO(2) was deposited at 80–250 °C by plasma-enhanced atomic layer deposition (PEALD), and properties were compared with those obtained by using thermal atomic layer deposition (thermal ALD). The ALD window, i.e., the region where the growth per cycle (GPC) is constant, shifted from high temperatures...

Descripción completa

Detalles Bibliográficos
Autores principales:	Kim, Kyoung-Mun, Jang, Jin Sub, Yoon, Soon-Gil, Yun, Ju-Young, Chung, Nak-Kwan
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	MDPI 2020
Materias:	Article
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7254199/ https://www.ncbi.nlm.nih.gov/pubmed/32344793 http://dx.doi.org/10.3390/ma13092008

Ejemplares similares

Surface Passivation of Silicon Using HfO(2) Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
por: Zhang, Xiao-Ying, et al.
Publicado: (2017)

Uniformity of HfO(2) Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
por: Choi, Boyun, et al.
Publicado: (2022)

Atomic Layer Deposition of HfO(2) Films Using TDMAH and Water or Ammonia Water
por: Gieraltowska, Sylwia, et al.
Publicado: (2023)

Characterization of Al Incorporation into HfO(2) Dielectric by Atomic Layer Deposition
por: Rahman, Md. Mamunur, et al.
Publicado: (2019)

HfS(2) thin films deposited at room temperature by an emerging technique, solution atomic layer deposition
por: Cao, Yuanyuan, et al.
Publicado: (2021)

Temperature- and Frequency-Dependent Ferroelectric Characteristics of Metal-Ferroelectric-Metal Capacitors with Atomic-Layer-Deposited Undoped HfO(2) Films
por: Jang, Chan-Hee, et al.
Publicado: (2022)

Atomic layer deposition for fabrication of HfO(2)/Al(2)O(3) thin films with high laser-induced damage thresholds
por: Wei, Yaowei, et al.
Publicado: (2015)

Thickness scaling of atomic-layer-deposited HfO(2) films and their application to wafer-scale graphene tunnelling transistors
por: Jeong, Seong-Jun, et al.
Publicado: (2016)

Bimolecular Reaction Mechanism in the Amido Complex-Based Atomic Layer Deposition of HfO(2)
por: D’Acunto, Giulio, et al.
Publicado: (2023)

Preparation of Remote Plasma Atomic Layer-Deposited HfO(2) Thin Films with High Charge Trapping Densities and Their Application in Nonvolatile Memory Devices
por: Yoo, Jae-Hoon, et al.
Publicado: (2023)

Electrical properties and thermal stability in stack structure of HfO(2)/Al(2)O(3)/InSb by atomic layer deposition
por: Baik, Min, et al.
Publicado: (2017)

Yttrium Doping Effects on Ferroelectricity and Electric Properties of As-Deposited Hf(1−x)Zr(x)O(2) Thin Films via Atomic Layer Deposition
por: Oh, Youkyoung, et al.
Publicado: (2023)

Microstructures of HfO(x) Films Prepared via Atomic Layer Deposition Using La(NO(3))(3)·6H(2)O Oxidants
por: Kim, Seon Yong, et al.
Publicado: (2021)

Reliability enhancement in thin film transistors using Hf and Al co-incorporated ZnO active channels deposited by atomic-layer-deposition
por: Na, So-Yeong, et al.
Publicado: (2018)

Magnetic and Electrical Performance of Atomic Layer Deposited Iron Erbium Oxide Thin Films
por: Tamm, Aile, et al.
Publicado: (2017)

High-throughput growth of HfO(2) films using temperature-gradient laser chemical vapor deposition
por: Tu, Rong, et al.
Publicado: (2022)

The Effects of Zr Doping on the Optical, Electrical and Microstructural Properties of Thin ZnO Films Deposited by Atomic Layer Deposition
por: Herodotou, Stephania, et al.
Publicado: (2015)

Nano-oxide thin films deposited via atomic layer deposition on microchannel plates
por: Yan, Baojun, et al.
Publicado: (2015)

Bipolar Resistive Switching Characteristics of HfO(2)/TiO(2)/HfO(2) Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
por: Zhang, Wei, et al.
Publicado: (2017)

Characterization of Structural, Optical, Corrosion, and Mechanical Properties of HfO(2) Thin Films Deposited Using Pulsed DC Magnetron Sputtering
por: Mańkowska, Ewa, et al.
Publicado: (2023)

Crystallinity Effect on Electrical Properties of PEALD–HfO(2) Thin Films Prepared by Different Substrate Temperatures
por: Zhang, Xiao-Ying, et al.
Publicado: (2022)

Interfacial, Electrical, and Band Alignment Characteristics of HfO(2)/Ge Stacks with In Situ-Formed SiO(2) Interlayer by Plasma-Enhanced Atomic Layer Deposition
por: Cao, Yan-Qiang, et al.
Publicado: (2017)

Structure and Electrical Behavior of Hafnium-Praseodymium Oxide Thin Films Grown by Atomic Layer Deposition
por: Kukli, Kaupo, et al.
Publicado: (2022)

Room-temperature bonding of Al(2)O(3) thin films deposited using atomic layer deposition
por: Takakura, Ryo, et al.
Publicado: (2023)

Effects of Al Doping on the Properties of ZnO Thin Films Deposited by Atomic Layer Deposition
por: Zhai, Chen-Hui, et al.
Publicado: (2016)

Atomic-Layer-Deposition of Indium Oxide Nano-films for Thin-Film Transistors
por: Ma, Qian, et al.
Publicado: (2018)

Atomic Layer Deposition of Photoconductive Cu(2)O Thin Films
por: Iivonen, Tomi, et al.
Publicado: (2019)

Atomic and Molecular Layer Deposition of Alkali Metal Based Thin Films
por: Madadi, Milad, et al.
Publicado: (2021)

Effect of Process Temperature on Density and Electrical Characteristics of Hf(0.5)Zr(0.5)O(2) Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
por: Kim, Hak-Gyeong, et al.
Publicado: (2022)

Compact Ga(2)O(3) Thin Films Deposited by Plasma Enhanced Atomic Layer Deposition at Low Temperature
por: Yang, Yue, et al.
Publicado: (2022)

Noble metal alloy thin films by atomic layer deposition and rapid Joule heating
por: Guo, Yuanyuan, et al.
Publicado: (2022)

High-performance HfO(x)/AlO(y)-based resistive switching memory cross-point array fabricated by atomic layer deposition
por: Chen, Zhe, et al.
Publicado: (2015)

Investigations on the bias temperature stabilities of oxide thin film transistors using In–Ga–Zn–O channels prepared by atomic layer deposition
por: Yoon, So-Jung, et al.
Publicado: (2018)

Atomic layer deposition of superparamagnetic ruthenium-doped iron oxide thin film
por: Tamm, Aile, et al.
Publicado: (2021)

Atomic Layer Deposition of Alumina-Coated Thin-Film Cathodes for Lithium Microbatteries
por: O’Donoghue, Aaron, et al.
Publicado: (2023)

The impact of thickness and thermal annealing on refractive index for aluminum oxide thin films deposited by atomic layer deposition
por: Wang, Zi-Yi, et al.
Publicado: (2015)

The Effect of Film Thickness on the Gas Sensing Properties of Ultra-Thin TiO(2) Films Deposited by Atomic Layer Deposition
por: Wilson, Rachel L., et al.
Publicado: (2018)

Effect of Ag Concentration Dispersed in HfO(x) Thin Films on Threshold Switching
por: Jeong, Won Hee, et al.
Publicado: (2020)

Mesoscopic-scale grain formation in HfO(2)-based ferroelectric thin films and its impact on electrical characteristics
por: Kobayashi, Masaharu, et al.
Publicado: (2022)

Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
por: Kim, Hyo Jin K., et al.
Publicado: (2019)

Cannot write session to /tmp/vufind_sessions/sess_nffea1vidbj0i1mrrderu7g286