Application of the Metal Reflector for Redistributing the Focusing Intensity of SPPs

The near-field photolithography system has attracted increasing attention in the micro- and nano-manufacturing field, due to the high efficiency, high resolution, and the low cost of the scheme. Nevertheless, the low quality of the nano-patterns significantly limits the industrial application of thi...

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Detalles Bibliográficos
Autores principales: Ji, Jiaxin, Xu, Pengfei, Lin, Zhongwen, Chen, Jiying, Li, Jing, Meng, Yonggang
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2020
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7279234/
https://www.ncbi.nlm.nih.gov/pubmed/32413982
http://dx.doi.org/10.3390/nano10050937

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7279234/
https://www.ncbi.nlm.nih.gov/pubmed/32413982
http://dx.doi.org/10.3390/nano10050937

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